Natural lithography
- 15 August 1982
- journal article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 41 (4) , 377-379
- https://doi.org/10.1063/1.93501
Abstract
A new form of microfabrication is presented in which spherical colloidal particles are used to define a large area lithographic mask. A monolayer of colloidal particles is deposited in either random or ordered array over the entire surface of a macroscopic substrate. Large area random or ordered mosaic arrays of identical submicron microcolumnar structures are produced by using the colloidal particles as either an etching or deposition mask.Keywords
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