A Novel Polymer for a 193-nm Resist.

• 1 January 1996
• journal article
• Published by Technical Association of Photopolymers, Japan in Journal of Photopolymer Science and Technology
• Vol. 9  (3) , 509-522
• https://doi.org/10.2494/photopolymer.9.509

Abstract

Keywords

• NOVEL POLYMER
• NM RESIST