Properties of hydrogenated amorphous silicon prepared by chemical vapor deposition
- 1 December 1983
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 59-60, 719-722
- https://doi.org/10.1016/0022-3093(83)90272-7
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Effect of oxygen on the optoelectronic properties of amorphous hydrogenated siliconPhysical Review B, 1981
- Properties of amorphous hydrogenated silicon, with special emphasis on preparation by sputteringSolar Energy Materials, 1981
- Published by Elsevier ,1980
- Thermal dehydrogenation of glow discharge a-SiJournal of Non-Crystalline Solids, 1980