Mass Analysis of Ion Beams from a Low-Voltage Spark Ion Source for Ion-Implantation Doping of Semiconductors
- 15 March 1967
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 38 (4) , 1976-1977
- https://doi.org/10.1063/1.1709795
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Zn and Te Implantations into GaAsJournal of Applied Physics, 1967
- DEEP (1–10 μ) PENETRATION OF ION-IMPLANTED DONORS IN SILICONApplied Physics Letters, 1966
- THE VACUUM VIBRATOR AS A SOURCE OF IONS FOR MASS SPECTROSCOPYCanadian Journal of Physics, 1963
- Ion Sources for Mass SpectroscopyReview of Scientific Instruments, 1936