Reactive magnetron sputtering of TiN: Analysis of the deposition process

This publication has 6 references indexed in Scilit:

• Reactive sputtering characteristics of silicon in an ArN2 mixture
  Thin Solid Films, 1986
• Mass flow limitations in reactive sputtering
  Thin Solid Films, 1985
• Mechanisms of the biased sputtering of titanium in an ArN2 mixture
  Thin Solid Films, 1984
• Deposition of hard wear-resistant coatings by reactive D.C. Plasmatron sputtering
  Thin Solid Films, 1984
• The analysis and automatic control of a reactive d.c. magnetron sputtering process
  Thin Solid Films, 1983
• Effect of N2Ar mixing on the reactive sputtering characteristics of silicon
  Thin Solid Films, 1983