Characterization of Co–O Thin Films by X-Ray Fluorescence Using Chemical Shifts of Absorption Edges
- 1 November 1987
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 26 (11R)
- https://doi.org/10.1143/jjap.26.1937
Abstract
The chemical shift of K absorption edges of cobalt oxides were measured by synchrotron radiation excited X-ray fluorescence technique using an energy dispersive detection system. A thin film of less than 100 angstroms can be easily characterized because of the significantly high sensitivity of the present method. The oxidation process of magnetic thin films of Co–O is quantitatively analyzed.Keywords
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