Characterization of Electron Traps in Aluminum-Implanted SiO₂

• 1 May 1978
• journal article
• Published by IBM in IBM Journal of Research and Development
• Vol. 22  (3) , 285-288
• https://doi.org/10.1147/rd.223.0285

Abstract

Keywords

• CHARGED PARTICLES
• ELEMENTARY PARTICLES
• HEAT TREATMENT
• CROSS SECTION
• ION IMPLANTATION