The orientation of vapour deposits
- 1 October 1962
- journal article
- research article
- Published by Taylor & Francis in Philosophical Magazine
- Vol. 7 (82) , 1671-1679
- https://doi.org/10.1080/14786436208213702
Abstract
Some probable effects of the structure of the critical nucleus on the orientation of the deposit are discussed. From this an expression relating the epitaxial temperature to the incidence rate can be obtained. A change in orientation from a (111) plane parallel to the substrate to a (100) parsllel to the substrate can also be understood on this basis. Finally an explanation is suggested for the parallel orientation of face-centred cubic metals on NaCl.Keywords
This publication has 4 references indexed in Scilit:
- The study of epitaxy in thin surface filmsAdvances in Physics, 1956
- NucleationProgress in Metal Physics, 1953
- Herstellung von dünnen Silbereinkristallen und ihre Untersuchung mit ElektronenstrahlenAnnalen der Physik, 1935
- Eine Bemerkung zu der Arbeit von H. Lassen und L. Brück: “Herstellung von dünnen Silbereinkristallen und ihre Untersuchung mit Elektronenstrahlen”Annalen der Physik, 1935