Plasma-enhanced CVD silicon nitride antireflection coatings for solar cells
- 1 January 1983
- journal article
- Published by Elsevier in Solar Energy
- Vol. 31 (4) , 355-358
- https://doi.org/10.1016/0038-092x(83)90133-0
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Properties of Plasma‐Deposited Silicon NitrideJournal of the Electrochemical Society, 1979
- Reactive Plasma Deposited Si-N Films for MOS-LSI PassivationJournal of the Electrochemical Society, 1978
- Fast computation method for derivatives of multilayer stack reflectanceApplied Optics, 1978
- Optical Constants of Epitaxial Silicon in the Region 1–3.3 eVPhysica Scripta, 1975