Abstract
This paper describes a new method for calculating the potential distribution in the depleted top layer and in the substrate of a buried-channel charge-coupled (BCCD) device. The depletion approximation is used. The experimental verification of the method is done by comparing the results with measured values for the maximum channel potential ΦMAX, the location Ymof that maximum, and the locationHof the edge of the p-n depletion layer into the substrate.

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