X-Ray masks for very deep X-Ray lithography

• 24 February 1998
• journal article
• Published by Springer Nature in Microsystem Technologies
• Vol. 4  (2) , 70-73
• https://doi.org/10.1007/s005420050098

Abstract

Keywords

• RAY MASKS
• HIGH ASPECT RATIO
• X RAY LITHOGRAPHY
• DEEP X RAY
• X RAY MASK
• ELECTRODEPOSITION PROCESS
• SYNCHROTRON RADIATION