Resist pattern fluctuation limits in extreme-ultraviolet lithography

• 1 July 1994
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 12  (4) , 2361-2371
• https://doi.org/10.1116/1.587765

Abstract

Keywords

• RESIST PATTERN
• EXTREME ULTRAVIOLET
• ULTRAVIOLET LITHOGRAPHY
• PATTERN FLUCTUATION LIMITS