Mechanical and electrical properties of fcc TiO1+x thin films prepared by r.f. reactive sputtering
- 10 October 1998
- journal article
- Published by Elsevier in Surface and Coatings Technology
- Vol. 108-109, 166-170
- https://doi.org/10.1016/s0257-8972(98)00629-x
Abstract
No abstract availableKeywords
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