Fundamental aspects of pulsating current metal electrodeposition V: The determination of the optimal frequency range
- 1 September 1982
- journal article
- Published by Elsevier in Surface Technology
- Vol. 17 (1) , 3-9
- https://doi.org/10.1016/0376-4583(82)90055-3
Abstract
No abstract availableKeywords
This publication has 3 references indexed in Scilit:
- Influence of charge and discharge of electric double layer in pulse platingJournal of Applied Electrochemistry, 1980
- Fundamental aspects of pulsating current metal electrodeposition I: The effect of the pulsating current on the surface roughness and the porosity of metal depositsSurface Technology, 1980
- Some theoretical aspects of pulse electrolysisSurface Technology, 1980