X-ray sources for microlithography created by laser radiation at λ=0.26 μm
- 1 January 1987
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 5 (1) , 27-32
- https://doi.org/10.1116/1.583883
Abstract
We discuss the conversion efficiency and spectral characteristics of x-ray sources produced by focusing 0.26 μm radiation on targets. We optimize the x-ray emission in given spectral ranges by choosing the appropriate target atomic number and irradiation conditions. We study the exposure of PBS photoresist with well characterized subkilovolt and kilovolt x-rays and find the sensitivity as well as the contrast of the resist increase with subkiloelectron volt radiation. The results confirm that the value of x-ray energy per unit volume absorbed at the resist surface is approximately independent of wavelength. A model for the development rate is also proposed to reproduce the experimental data.This publication has 0 references indexed in Scilit: