Thickness Dependence of Etching Rate in Dry Photoetching of Organic Resists
- 1 September 1986
- journal article
- Published by IOP Publishing in Japanese Journal of Applied Physics
- Vol. 25 (9R)
- https://doi.org/10.1143/jjap.25.1455
Abstract
This paper descrives experimental evidence that the etch rate in the dry photoetching of an organic resist, copolymer of 3,3,4,4,5,5,6,6,6-nonafluorohexyl methacrylate with methyl methacrylate, depends on the initial-film thickness as well as on the exposure time. The results indicate the predominance of a bulk effect over a surface effect during photoetching.Keywords
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