Substrate properties affect the mass loss rate in collodion at liquid helium temperature
- 1 April 1989
- journal article
- research article
- Published by Elsevier in Ultramicroscopy
- Vol. 27 (3) , 241-249
- https://doi.org/10.1016/0304-3991(89)90017-x
Abstract
No abstract availableThis publication has 32 references indexed in Scilit:
- Mass loss rate in collodion is greatly reduced at liquid helium temperatureJournal of Microscopy, 1987
- Cryoprotection in electron microscopyJournal of Microscopy, 1986
- Mass thickness determination by electron energy loss for quantitative X‐ray microanalysis in biologyJournal of Microscopy, 1984
- Amendment to: Electron beam damage to organic specimens at liquid helium temperatureJournal of Molecular Biology, 1983
- Radiation damage in l-valine at liquid helium temperatureNature, 1983
- Beam damage to organic material is considerably reduced in cryo-electron microscopyJournal of Molecular Biology, 1980
- Radiation damage in electron microscopy of organic materials: effect of low temperaturesJournal of Microscopy, 1975
- Radiation damage in stained catalase at low temperatureJournal of Microscopy, 1975
- Electrical Properties of Titanium, Zirconium, and Hafnium Films from 300 °K to 1.3 °KJournal of Vacuum Science and Technology, 1969
- Wirkungsquerschnitte f r elastische und unelastische Elektronenstreuung an amorphen Kohlenstoff- und GermaniumschichtenThe European Physical Journal A, 1965