Nanocrystalline silicon formation in a SiH4 plasma cell
- 1 May 1996
- journal article
- Published by Elsevier in Journal of Non-Crystalline Solids
- Vol. 198-200, 875-878
- https://doi.org/10.1016/0022-3093(96)00161-5
Abstract
No abstract availableKeywords
Funding Information
- Japan Society for the Promotion of Science
- Ministry of Education, Culture, Sports, Science and Technology
- Asahi Glass Foundation
- Kurata Memorial Hitachi Science and Technology Foundation
This publication has 3 references indexed in Scilit:
- Experimental investigation of particulate formation in He-SiH4modulated RF dischargesPlasma Sources Science and Technology, 1994
- Laser-Induced-Fluorescence Detection of SiH2 Radicals in a Radio-Frequency Silane PlasmaJapanese Journal of Applied Physics, 1993
- Keimbildung in übersättigten GebildenZeitschrift für Physikalische Chemie, 1926