A Comparison of Internal Gettering during Bipolar, CMOS, and CCD (High, Medium, Low Temperature) Processes
- 1 April 1987
- journal article
- Published by The Electrochemical Society in Journal of the Electrochemical Society
- Vol. 134 (4) , 1018-1025
- https://doi.org/10.1149/1.2100559
Abstract
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