Back surface gettering and Cr out-diffusion in VPE GaAs layers

Abstract
Mechanical back surface damage gettering has been investigated for improving the quality of GaAs substrates and VPE layers on semi-insulating GaAs. It has been shown that the pregettering of substrates reduces the interfacial defect density and alters the level of Cr out-diffusion into the VPE layer during growth. At a postdeposition anneal temperature of 800 °C, Cr out-diffusion into the VPE layer is relatively suppressed in the pregettered substrate, while the ungettered sample shows larger concentrations of Cr within the epitaxial layer.

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