Photoelectrochemical investigations of thin metal-oxide films: TiO2, Al2O3, and HfO2 on the parent metals
- 31 January 1993
- journal article
- Published by Elsevier in Electrochimica Acta
- Vol. 38 (1) , 15-27
- https://doi.org/10.1016/0013-4686(93)80005-k
Abstract
No abstract availableKeywords
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