Evidence of depth and lateral diffusion of defects during focused ion beam implantation
- 1 July 1998
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B
- Vol. 16 (4) , 1919
- https://doi.org/10.1116/1.590108
Abstract
No abstract availableKeywords
This publication has 0 references indexed in Scilit: