Application of Two-Step Deposition Method To Ultra-Thin a-Si FETs
- 1 January 1986
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 4 references indexed in Scilit:
- Ultra-Thin Amorphous-Silicon Transistors Fabricated by Two-Step Deposition MethodJapanese Journal of Applied Physics, 1986
- Ultra-thin film a-Si:H transistorsJournal of Non-Crystalline Solids, 1985
- Amorphous Semiconductor SuperlatticesPhysical Review Letters, 1983
- Electronic properties of substitutionally doped amorphous Si and GePhilosophical Magazine, 1976