The effect of nonlinear ion transport on the rate of laser-induced electrochemical etching of semiconductors
- 15 February 1990
- journal article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 67 (4) , 1947-1949
- https://doi.org/10.1063/1.345571
Abstract
No abstract availableThis publication has 4 references indexed in Scilit:
- Photoelectrochemical etching of n-GaAs and n-InPPhysica Status Solidi (a), 1988
- Basic mechanisms in laser etching and depositionApplied Physics A, 1986
- Hole transport equation analysis of photoelectrochemical etching resolutionJournal of Applied Physics, 1985
- Autowave processes in a distributed chemical systemJournal of Theoretical Biology, 1973