In situX-ray topographic study of the dislocation mobility in high-purity and impurity-doped silicon crystals
- 1 April 1983
- journal article
- Published by Taylor & Francis in Philosophical Magazine Part B
- Vol. 47 (4) , 599-621
- https://doi.org/10.1080/13642818308246459
Abstract
No abstract availableThis publication has 29 references indexed in Scilit:
- Velocities of screw and 60° dislocations in n- and p-type siliconPhysica Status Solidi (a), 1979
- A simple scheme for describing the motion of dislocations in siliconCrystal Research and Technology, 1978
- Investigation of the energy spectrum and kinetic phenomena in dislocated Si crystals (I)Physica Status Solidi (a), 1977
- Velocities of Screw and 60°‐Dislocations in SiliconPhysica Status Solidi (b), 1972
- Effect of Impurities on the Individual Dislocation Mobility in SiliconPhysica Status Solidi (b), 1969
- Chemical Influence of Holes and Electrons on Dislocation Velocity in SemiconductorsPhysical Review Letters, 1967
- A CRITICAL REVIEW OF THE PEIERLS MECHANISMCanadian Journal of Physics, 1967
- Theory of Dislocation Mobility in SemiconductorsPhysical Review B, 1963
- Velocities and Densities of Dislocations in Germanium and Other Semiconductor CrystalsJournal of Applied Physics, 1962
- Distribution of solute atoms round a slow dislocationProceedings of the Royal Society of London. Series A. Mathematical and Physical Sciences, 1949