Effect of residual gas pressure on the epitaxial growth of vacuum-deposited chromium on Cu{111} substrates
- 1 March 1986
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 137 (2) , 337-349
- https://doi.org/10.1016/0040-6090(86)90035-0
Abstract
No abstract availableKeywords
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