Field Ion Microscopy of Vapor-Deposited Platinum on Tungsten

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Abstract
Platinum was vapor-deposited on tungsten under high vacuum conditions. The resultant thin films were then examined in the field ion microscope at 78 °K. The platinumdeposits were obtained under three different conditions. Deposits on substrate held at 78 °K gave several localized but crystalline deposits which were 10–100 Å in diameter and approximately 25 Å thick. A short anneal of the substrate at 1100 °K, after deposition was performed at 78 °K, resulted in evidence for the existence of a pseudomorphic deposit of platinum on tungsten, less than 10 Å in thickness. Deposition at 1100 °K followed by annealing at 1100 °K resulted in appreciable bulk diffusion and the field ion images obtained were typical of those from alloys.

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