Measurement of the thickness of thin layers by ultrasonic interferometry

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Abstract
An ultrasonic interferometer working in a pulsed mode is described in this paper. It allows for the measurement of coating thicknesses as thin as 5 μm with a 5% precision over different substrates at a very high rate (up to 1000 times per second). The optimal conditions for this interferometric measurement are defined theoretically and the probe characteristics have been optimized technologically. This, together with the design of a very large frequency bandwidth (from 90 to 510 MHz) electronic setup, leads to interesting performances. The advantages of the system for achieving thickness measurements are discussed and comparisons are made with other systems.

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