Reaction kinetics of the formation of indium tin oxide films grown by spray pyrolysis
- 1 December 1990
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 193-194, 696-703
- https://doi.org/10.1016/0040-6090(90)90221-x
Abstract
No abstract availableThis publication has 10 references indexed in Scilit:
- A tin oxide thin film sensor with high ethanol sensitivityThin Solid Films, 1989
- Properties of thin In2O3 and SnO2 films prepared by corona spray pyrolysis, and a discussion of the spray pyrolysis processThin Solid Films, 1984
- Corona spray pyrolysis: A new coating technique with an extremely enhanced deposition efficiencyThin Solid Films, 1984
- Deposition of In2O3SnO2 layers on glass substrates using a spraying methodThin Solid Films, 1981
- Transparent heat-reflecting coatings based on highly doped semiconductorsThin Solid Films, 1981
- Electrical properties of vacuum-deposited indium oxide and indium tin oxide filmsThin Solid Films, 1980
- SnO2/Si solar cells—heterostructure or Schottky-barrier or MIS-type deviceJournal of Applied Physics, 1978
- The fundamentals of chemical vapour depositionJournal of Materials Science, 1977
- Optical and electrical properties of SnO2 thin films in relation to their stoichiometric deviation and their crystalline structureThin Solid Films, 1977
- Optical and electrical properties of doped In2O3 filmsPhysica Status Solidi (a), 1975