A rewiring technique for integrated circuit operation analysis using a silicon oxide film deposited by a focused ion beam
- 1 September 1991
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 9 (5) , 2653-2655
- https://doi.org/10.1116/1.585665
Abstract
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