The observation of coupling between low- and high-frequency resonances in a bounded plasma
- 1 January 1969
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in Proceedings of the IEEE
- Vol. 57 (12) , 2151-2152
- https://doi.org/10.1109/PROC.1969.7502
Abstract
The coupling between low- and high-frequency resonances of a plasma capacitor is discussed. A low-frequency ion oscillation is found to cause the zero-order density profile to vary at ωi. This variation of the density profile causes the third-harmonic output of the capacitor to be frequency modulated.Keywords
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