Effect of Strain and Interface Interdiffusion on the Valence Band Offset at Si/Ge Interfaces
- 1 January 1989
- journal article
- Published by Springer Nature in MRS Proceedings
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
- Core-level photoemission measurements of valence-band offsets in highly strained heterojunctions: Si-Ge systemPhysical Review B, 1989
- Structural and electronic properties of epitaxial thin-layersuperlatticesPhysical Review B, 1988
- Strain in ultrathin epitaxial films of Ge/Si(100) measured by ion scattering and channelingPhysical Review Letters, 1987
- Acoustic deformation potentials and heterostructure band offsets in semiconductorsPhysical Review B, 1987
- Theoretical calculations of heterojunction discontinuities in the Si/Ge systemPhysical Review B, 1986
- Pseudopotentials and Total Energy Calculations: Applications to Crystal Stability, Vibrational Properties, Phase Transformations, and Surface StructuresPublished by Springer Nature ,1985
- Theory of semiconductor heterojunctions: The role of quantum dipolesPhysical Review B, 1984
- Polar heterojunction interfacesPhysical Review B, 1978