Spiral growth in epitaxial YBa2Cu3O7−x thin films produced by high deposition rate chemical vapor deposition
- 1 February 1993
- journal article
- research article
- Published by AIP Publishing in Applied Physics Letters
- Vol. 62 (5) , 485-486
- https://doi.org/10.1063/1.108914
Abstract
A technologically useful chemical vapor deposition process with high growth rate (≳4 μm/h) was developed for the epitaxial growth of YBa2Cu3O7−x (YBCO) thin films. Even at the high growth rate used in this process, a spiral growth mechanism was observed and the films grown had electrical (Tc=92 K, Jc of 2×106A/cm2 at 77 K) and structural properties equal to films produced by physical vapor deposition.Keywords
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