Development of an ionized cluster beam system for large-area deposition
- 1 February 1989
- journal article
- Published by Elsevier in Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
- Vol. 37-38, 779-782
- https://doi.org/10.1016/0168-583x(89)90297-8
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- SiO2 films deposited on Si by an ionized cluster beamJournal of Vacuum Science & Technology B, 1983
- Vaporized-metal cluster formation and ionized-cluster beam deposition and epitaxyThin Solid Films, 1981