Design and performance of a 4 in. electron image projector

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Abstract
An electron image projector has been designed and built which is currently exposing 4 in. wafers and has the capability of going to 5 in. Linewidth control of ±0.04 μm for 1 μm lines has been measured over the whole surface of 4 in. wafers. Machine alignment accuracy of ±0.03 μm has been achieved and nonrepeatable image distortion is shown to be less than 0.1 μm. Examples of resolution capability and step coverage are also shown.

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