In-situ monitor and control using fast spectroscopic ellipsometry
- 16 August 1996
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- Vol. 2873, 140-144
- https://doi.org/10.1117/12.246202
Abstract
A four gun magnetron sputter deposition chamber equipped with in-situ spectroscopic ellipsometry is described, and the results of precisely controlled multilayered metallic and dielectric materials are reported. These structures have applications in magneto-optic memories, as well as giant magneto resistance and spin-valve magnetic read-heads.Keywords
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