Cross-correlation between actinic and visible defect inspection tool for extreme ultraviolet lithography
- 30 December 1999
- proceedings article
- Published by SPIE-Intl Soc Optical Eng
- p. 814-821
- https://doi.org/10.1117/12.373375
Abstract
We present recent experimental results from an actinic (operates at the EUV wavelength) defect inspection system for extreme ultraviolet lithography mask blanks. A method to cross-register and cross-correlate between the actinic inspection system and a commercial visible-light scattering defect inspection system is demonstrated. Thus, random, real defects detected using the visible-light scattering inspection tool can be found and studied by our actinic inspection tool. Several defects with sub-100 nm size (as classified by the visible scattering tool) are found with the actinic inspection tool with a good signal to noise ratio. This result demonstrates the capability of the actinic inspection tool for independent defect counting experiments at a sub-100 nm defect sensitivity level.Keywords
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