Highly conductive and transparent films of tin and fluorine doped indium oxide produced by APCVD
- 10 December 1992
- journal article
- Published by Elsevier in Thin Solid Films
- Vol. 221 (1-2) , 166-182
- https://doi.org/10.1016/0040-6090(92)90811-o
Abstract
No abstract availableKeywords
This publication has 27 references indexed in Scilit:
- Indium-Tin Oxide Thin Films Prepared by Chemical Vapor Deposition from Metal AcetatesJapanese Journal of Applied Physics, 1990
- Texture Morphology of SnO2:F Films and Cell ReflectanceJapanese Journal of Applied Physics, 1988
- Solid-state and surface chemistry of Sn-doped In2O3 ceramicsJournal of Solid State Chemistry, 1987
- Sol-gel derived transparent IR-reflecting ITO semiconductor coatings and future applicationsJournal of Non-Crystalline Solids, 1984
- Transparent conductors—A status reviewThin Solid Films, 1983
- Electrical properties and defect model of tin-doped indium oxide layersApplied Physics A, 1982
- Heat mirror coatings for energy conserving windowsSolar Energy Materials, 1981
- In2O3 : (Sn) and SnO2 : (F) films - application to solar energy conversion part II — Electrical and optical propertiesMaterials Research Bulletin, 1979
- Transparent gate silicon photodetectorsIEEE Transactions on Electron Devices, 1978
- Chemical vapor deposition of transparent electrically conducting layers of indium oxide doped with tinThin Solid Films, 1975