Effect of side wall roughness in buried channel waveguides

1 August 1994

journal article
Published by Institution of Engineering and Technology (IET) in IEE Proceedings - Optoelectronics

Vol. 141 (4) , 242-248
https://doi.org/10.1049/ip-opt:19941085

Abstract

An atomic force microscope is employed to measure the edge roughness of masks used in the fabrication of rectangular-core buried channel waveguides (BCWs) and to compare this with the corresponding roughness of the etched BCWs. Light attenuation due to scattering loss from the sides of the core can then be estimated using a simple statistical model to process the measured data.

Keywords

ATOMIC FORCE MICROSCOPE
MASKS
MEASURED DATA
STATISTICAL MODEL
EDGE ROUGHNESS
ETCHED BCWS
SCATTERING LOSS
SIDE WALL ROUGHNESS
LIGHT ATTENUATION
BURIED CHANNEL WAVEGUIDES
RECTANGULAR-CORE BURIED CHANNEL WAVEGUIDE FABRICATION MASKS

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