Channelled substrate buried heterostructure InGaAsP/InP laser emitting at 1.55 μm

Abstract
An InGaAsP/InP channelled substrate buried heterostructure (c.s.b.) laser emitting at 1.55 μm is fabricated by channel etching and single-stage l.p.e. growth without a low temperature growth technique or antimeltback layer. The c.s.b. laser shows low threshold current at room temperature c.w. operation and stable single transverse mode operation.

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