Mechanism and Control of Post-Trim Drift of Laser-Trimmed Thick-Film Resistors
- 1 June 1978
- journal article
- Published by Institute of Electrical and Electronics Engineers (IEEE) in IEEE Transactions on Components, Hybrids, and Manufacturing Technology
- Vol. 1 (2) , 130-136
- https://doi.org/10.1109/tchmt.1978.1135262
Abstract
No abstract availableKeywords
This publication has 8 references indexed in Scilit:
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- Stress and Structural Relaxation in Na2O‐CaO‐SiO2 GlassJournal of the American Ceramic Society, 1974
- Laser Trimming of Thick Film ResistorsActive and Passive Electronic Components, 1974
- Stress and Volume Relaxation in Annealing Flat GlassJournal of the American Ceramic Society, 1970
- Mechanical Properties of Thin Nickel FilmsJournal of Applied Physics, 1965
- Relaxation Spectra and Relaxation Processes in Solid Polymers and GlassesPublished by Elsevier ,1965
- Annealing of residual stress in silicon monoxide filmsBritish Journal of Applied Physics, 1961
- Calculation of stress in electrodeposits from the curvature of a plated stripJournal of Research of the National Bureau of Standards, 1949