Thermal oxide on CdSe

Abstract
X-ray photoelectron spectroscopy (XPS) has been used to characterize the thin thermal oxide film grown on single crystal CdSe(0001) and polycrystalline CdSe by exposure to O2 (dry air) at 350 ° C. SeOx species, where x=2,3 , are clearly identified by a 5 eV shift of the Se 3d3/2,5/2 peaks to higher binding energy. A very weak shift to lower binding energy is observed for the Cd peaks. The positions of the Cd and O peaks do not match those found for the known cadmium oxides, CdO and CdO2 . Instead, it is proposed that the Cd bound oxygen atoms occupy substitutional Se sites. The presence of Cd bound oxygen can also be inferred from the intensities of the SeOx, Cd, and O peaks. Raman spectroscopy confirms the existence of O in Se substitutional sites. Angle-resolved XPS is used to determine the thickness of the oxide and the relative amount of SeOx and Cd bound oxygen. The XPS data are consistent with an 8–9 Å thick oxide where 60% of the oxygen is bound to Se and 40 is bound to Cd. The data show that the oxide structure contains two layers; a passivation layer made of the SeOx species and, underneath, a layer containing oxygen in Se substitutional sites.