Electron Holography on Beam Sensitive Materials: Organic Polymers and Mesoporous Silica
- 20 March 2002
- journal article
- research article
- Published by American Chemical Society (ACS) in Chemistry of Materials
- Vol. 14 (4) , 1505-1514
- https://doi.org/10.1021/cm011140q
Abstract
No abstract availableKeywords
This publication has 20 references indexed in Scilit:
- Iron and copper immobilised on mesoporous MCM-41 molecular sieves as catalysts for the oxidation of cyclohexaneJournal of Molecular Catalysis A: Chemical, 1999
- Electron Holography at Atomic Dimensions—Present StateMaterials Characterization, 1999
- Two Dimensional Mapping of pn Junctions by Electron HolographySolid State Phenomena, 1998
- Measurement of Polystyrene Mean Inner Potential by Transmission Electron Holography of Latex SpheresMicroscopy and Microanalysis, 1998
- Space‐Charge Distribution across Internal Interfaces in Electroceramics Using Electron Holography: I, Pristine Grain BoundariesJournal of the American Ceramic Society, 1997
- Advances in Mesoporous Molecular Sieve MCM-41Industrial & Engineering Chemistry Research, 1996
- Electron Microscopy in Polymer ScienceApplied Spectroscopy Reviews, 1993
- A new family of mesoporous molecular sieves prepared with liquid crystal templatesJournal of the American Chemical Society, 1992
- Electron Holographic Observations of the Electrostatic Field Associated with Thin Reverse-BiasedJunctionsPhysical Review Letters, 1985
- Phase contrast imaging of styrene-isoprene and styrene-butadiene block copolymersMacromolecules, 1983