Laser diagnostics of plasma etching: Measurement of Cl+2 in a chlorine discharge

• 1 September 1982
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science and Technology
• Vol. 21  (3) , 817-823
• https://doi.org/10.1116/1.571829

Abstract

Keywords

• RADIO FREQUENCY
• QUALITATIVE METHOD
• LASER INDUCED FLUORESCENCE
• PLASMA ETCHING
• PLASMA PHYSICS
• ELECTROMAGNETIC RADIATION
• RELATIVE DENSITY
• CHARGED PARTICLES
• RADIATION PRESSURE