Dislocation Planes in Semiconductors
- 1 April 1959
- journal article
- conference paper
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 30 (4) , 581-589
- https://doi.org/10.1063/1.1702409
Abstract
Dislocations and mainly dislocation planes, as the most important nonchemical imperfections in semiconductor crystals, are discussed from the point of view of their influence on carrier transport. After a short review of the general properties of grain boundary planes of medium angle of misfit, the electrical effects are discussed, including the barrier behavior, the band structure, and lifetime anisotropy. Devices tructures based on these properties of dislocation planes are described among which the dislocation field effect transistor shows promising features as the first temperature independent transistor in the range 300°K to 2°K.This publication has 8 references indexed in Scilit:
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- Surface Barriers at Semiconductor ContactsProceedings of the Physical Society. Section B, 1956
- Zum elektrischen Verhalten von BikristallzwischenschichtenThe European Physical Journal A, 1956
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- CXXIV. Statistics of the occupation of dislocation acceptor centresJournal of Computers in Education, 1954
- Grain Boundary Barriers in GermaniumPhysical Review B, 1952
- Dislocation Models of Crystal Grain BoundariesPhysical Review B, 1950