Optically excited resonant beam pressure sensor

3 December 1987

journal article
Published by Institution of Engineering and Technology (IET) in Electronics Letters

Vol. 23 (25) , 1333-1334
https://doi.org/10.1049/el:19870921

Abstract

Micromechanical silicon beams fabricated by anisotropic etching techniques are coated with a thin layer of chromium. An intensity-modulated laser beam focused on the beam generates transverse vibrations which are detected interferometrically. In the letter we report how the vibration frequency changes with temperature and pressure applied to the beam.

Keywords

INTENSITY-MODULATED LASER BEAM
VIBRATION FREQUENCY
OPTICAL FIBRE COMPATIBLE
OPTICALLY EXCITED RESONANT BEAM
RESONANT BEAM PRESSURE SENSOR
ANISOTROPIC ETCHING TECHNIQUES
MICROMECHANICAL BEAMS IN SILICON
RESONANT FREQUENCY
CR THIN FILM
INTERFEROMETRY
TRANSVERSE VIBRATIONS
SI BEAMS
TEMPERATURE

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