Multicoincidence mass spectrometry applied to hexamethyldisilane excited around the silicon 2p edge
- 1 May 1993
- journal article
- research article
- Published by American Chemical Society (ACS) in The Journal of Physical Chemistry
- Vol. 97 (20) , 5228-5237
- https://doi.org/10.1021/j100122a011
Abstract
No abstract availableKeywords
This publication has 2 references indexed in Scilit:
- Relaxation processes following excitation and ionization of SiF4 in the vicinity of the silicon 2p threshold. II. Dissociation of the molecular ionsThe Journal of Chemical Physics, 1989
- Relaxation processes following excitation and ionization of SiF4 in the vicinity of the silicon 2p threshold. I. Electronic relaxation processesThe Journal of Chemical Physics, 1989