Effects of etch products and surface oxidation on profile evolution during electron cyclotron resonance plasma etching of poly-Si
- 1 September 1996
- journal article
- Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
- Vol. 14 (5) , 3291-3298
- https://doi.org/10.1116/1.588822
Abstract
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