Influence of Vacuum Conditions on Epitaxially Grown Permalloy Films
- 1 June 1963
- journal article
- research article
- Published by AIP Publishing in Journal of Applied Physics
- Vol. 34 (6) , 1575-1580
- https://doi.org/10.1063/1.1702638
Abstract
Permalloy films (83 wt% Ni‐17 wt% Fe) epitaxially grown on (100) NaCl were examined in the electron microscope before and after beam annealing. An ultra‐high vacuum system with an ultimate vacuum of 10−10 Torr and a vacuum system with an ultimate vacuum of 10−6 Torr were used for the evaporation. Films at 10−5 Torr were prepared in both systems to rule out the influence of the vacuum system on the films. Evaporation rates were adjusted to either 30 Å/sec or 14 Å/min. Electron micrographs and electron diffraction patterns showed that the films ranged from polycrystalline for films evaporated at 30 Å/sec and 10−5 Torr to single crystalline with grains of several millimeters diameter for films evaporated at 30 Å/sec and 10−9 Torr. The crystallographic misorientation varied widely in films which were partially single crystalline and amounted to only a few degrees over areas up to ⅛‐in. diameter for films which exhibited perfect single‐crystal electron diffraction patterns.This publication has 10 references indexed in Scilit:
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