Etching 0.35 μm polysilicon gates on a high-density helicon etcher

• 1 January 1996
• journal article
• Published by American Vacuum Society in Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
• Vol. 14  (1) , 543-546
• https://doi.org/10.1116/1.588427

Abstract

Keywords

• ETCHING
• M POLYSILICON
• HELICON ETCHER
• POLYSILICON GATES
• DENSITY HELICON